Name: Study of the surface layer of silicon with indium coating (en Inglés)
SKU: 66197833
Price: 661.12 MXN
Availability: InStock
Author: Shmermbek, Yulia; Leonid Ivanovich, Grechikhin
ISBN: 9786202210706

portada Study of the surface layer of silicon with indium coating (en Inglés)

Study of the surface layer of silicon with indium coating (en Inglés)

Formato

Libro Físico

Editorial

Our Knowledge Publishing

Autor

Shmermbek, Yulia; Leonid Ivanovich, Grechikhin

Idioma

Inglés

N° páginas

Encuadernación

Tapa Blanda

Dimensiones

22.9x15.2x0.5 cm

ISBN13

9786202210706

Study of the surface layer of silicon with indium coating (en Inglés)

Shmermbek, Yulia; Leonid Ivanovich, Grechikhin (Autor) · Our Knowledge Publishing · Tapa Blanda

Libro Nuevo Importado

Envío: 23 a 28 días háb.

$ 1,202.05$ 661.12

-45%

Costos de importación incluídos en el precio ✅

Libro Nuevo

Quedan 10 unidades

$ 661.12

¡Envío Gratis! Llega entre el 01 Dic y el 09 Dic a CUAUHTÉMOC, Ciudad de México. Seleccionar ubicación

Agregar a lista de deseos

Reseña del libro "Study of the surface layer of silicon with indium coating (en Inglés)"

This work relates to the field of nanotechnology, which has been developing rapidly in recent decades. Many aspects remain unclear and require further study. The proposed work contains an analysis of the patterns of formation of reconstruction elements and cluster structures on Si(111) and Si(557) surfaces. The features of the emergence of 7x7 reconstruction on the vicinal surface of Si(557) are investigated. It has been established that, unlike on the Si(111) surface, the formation of clusters on the Si(557) surface does not begin immediately with the start of deposition. The delay is up to 20% of the total monolayer deposition time. During this delay, indium atoms are deposited on the steps, forming areas of unstructured indium coating. An attempt was made to explain the reason for the formation of such complex reconstructions as 7x7 or 5x5. A version of the STMS technique was formulated, which involves simultaneous scanning of the surface relief and removal of spectroscopic dependencies.