Name: Particles in Gases and Liquids 2: Detection, Characterization, and Control (Symposium on Particles in Gases and Liquids: Detection, Characterization, and Control (en Inglés)
SKU: 18949643
Price: 2376.17 MXN
Availability: InStock
Author: Symposium On Particles In Gases And Liqu
ISBN: 9780306438097

portada Particles in Gases and Liquids 2: Detection, Characterization, and Control (Symposium on Particles in Gases and Liquids: Detection, Characterization, and Control (en Inglés)

Particles in Gases and Liquids 2: Detection, Characterization, and Control (Symposium on Particles in Gases and Liquids: Detection, Characterization, and Control (en Inglés)

Formato

Libro Físico

Editorial

Springer

Autor

Symposium On Particles In Gases And Liqu

Año

1991

Idioma

Inglés

N° páginas

407

Encuadernación

Tapa Dura

ISBN

0306438097

ISBN13

9780306438097

N° edición

1990

Categorías

Química física

Particles in Gases and Liquids 2: Detection, Characterization, and Control (Symposium on Particles in Gases and Liquids: Detection, Characterization, and Control (en Inglés)

Symposium On Particles In Gases And Liqu (Autor) · Springer · Tapa Dura

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Reseña del libro "Particles in Gases and Liquids 2: Detection, Characterization, and Control (Symposium on Particles in Gases and Liquids: Detection, Characterization, and Control (en Inglés)"

This book chronicles the proceedings of the Second Symposium on Particles in Gases and Liquids: Detection, Characterization and Control held as a part of the 20th Annual Fine Particle Society meeting in Boston, August 21-25, 1989. As this second symposium was as successful as the prior one, so we have decided to hold symposia on this topic on a regular (biennial) basis and the third symposium in this series is scheduled to be held at the 22nd Annual Meeting of the Fine Particle Society in San Jose, California, July 29-August 2, 1991. l As pointed out in the Preface to the prior volume in this series that recently there has been tremendous concern about yield losses due to unwanted particles, and these unwelcome particles can originate from a legion of sources, including process gases and liquids. Also all signals indicate that in the future manufacture of sophisticated and sensitive microelectronic components (with shrinking dimensions) and other precision parts, the need for detection, characterization, analysis and control of smaller and smaller particles will be more intensified.