Name: Ion Implantation in Semiconductors: Science and Technology (en Inglés)
SKU: 58367888
Price: 989.14 MXN
Availability: InStock
Author: Namba, Susumu
ISBN: 9781468421538

portada Ion Implantation in Semiconductors: Science and Technology (en Inglés)

Ion Implantation in Semiconductors: Science and Technology (en Inglés)

Formato

Libro Físico

Editorial

Springer

Autor

Namba, Susumu

Idioma

Inglés

N° páginas

742

Encuadernación

Tapa Blanda

Dimensiones

25.4x17.8x3.9 cm

Peso

1.30 kg.

ISBN13

9781468421538

Categorías

Física de la materia condensada (física del estado líquido y del estado sólido)
Análisis espectral, espectroquímica, espectrometría de masas
Dispositivos y materiales electrónicos

Ion Implantation in Semiconductors: Science and Technology (en Inglés)

Namba, Susumu (Autor) · Springer · Tapa Blanda

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Reseña del libro "Ion Implantation in Semiconductors: Science and Technology (en Inglés)"

The technique of ion implantation has become a very useful and stable technique in the field of semiconductor device fabrication. This use of ion implantation is being adopted by industry. Another important application is the fundamental study of the physical properties of materials. The First Conference on Ion Implantation in Semiconductors was held at Thousand Oaks, California in 1970. The second conference in this series was held at Garmish-Partenkirchen, Germany, in 1971. At the third conference, which convened at Yorktown Heights, New York in 1973, the emphasis was broadened to include metals and insulators as well as semiconductors. This scope of the conference was still accepted at the fourth conference which was held at Osaka, Japan, in 1974. A huge number of papers had been submitted to this conference. All papers which were presented at the Fourth International Conference on Ion Implantation in Semiconductors and Other Materials are included in this proceedings. The success of this conference was due to technical presentations and discussions of 224 participants from 14 countries as well as to financial support from many companies in Japan. On behalf of the committee, I wish to thank the authors for their excellent papers and the sponsors for their financial support. The International Committee responsible for advising this conference consisted of B.L. Crowder, J.A. Davies, G. Dearna1ey, F.H. Eisen, Ph. G1otin, T. Itoh, A.U. MacRae, J.W. Mayer, S. Namba, I. Ruge, and F.L. Vook.