Name: Chemical Etching Behaviour of a Polyimide (en Inglés)
SKU: 62748373
Price: 555.96 MXN
Availability: InStock
Author: Deep Shikha
ISBN: 9783668084186

portada Chemical Etching Behaviour of a Polyimide (en Inglés)

Chemical Etching Behaviour of a Polyimide (en Inglés)

Formato

Libro Físico

Editorial

Grin Verlag

Autor

Deep Shikha

Idioma

Inglés

N° páginas

Encuadernación

Tapa Blanda

ISBN13

9783668084186

Chemical Etching Behaviour of a Polyimide (en Inglés)

Deep Shikha (Autor) · Grin Verlag · Tapa Blanda

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Reseña del libro "Chemical Etching Behaviour of a Polyimide (en Inglés)"

Scientific Study from the year 2009 in the subject Physics - Nuclear Physics, Molecular Physics, Solid State Physics, grade: A, language: English, abstract: Investigations were carried out on etching behaviour of an engineering polymer Kapton-H (4-4'-oxydiphenylene pyromellitimide). Kapton-H samples were subjected to etching in 4N NaOH at 400 C and at 500 C temperatures in pristine as well as irradiated form. Irradiation of pristine Kapton-H specimen was done using 75 MeV/nucleon O+ ion beam of fluence 1.875 x a trillion ions/cm2. The specimen was exposed to etchant for a period of 150 minutes. The effect of etching was observed as half layer thickness removed. Thickness measurements were made at etching cycles of 15 minutes each. It was observed that temperature and the irradiation has their effect on etching behaviour of Kapton-H. Study showed that the temperature results in the increased average bulk etch rate. The average bulk etch rate was also observed to increase with the irradiation of the sample.