Name: Annealing Temperatures Effect on Nickel Oxide Thin Films (en Inglés)
SKU: 62147415
Price: 1052.33 MXN
Availability: InStock
Author: Said Benramache; Okba Belahssen
ISBN: 9786207639441

portada Annealing Temperatures Effect on Nickel Oxide Thin Films (en Inglés)

Annealing Temperatures Effect on Nickel Oxide Thin Films (en Inglés)

Formato

Libro Físico

Editorial

Lap Lambert Academic Publishing

Autor

Said Benramache; Okba Belahssen

Idioma

Inglés

N° páginas

Encuadernación

Tapa Blanda

ISBN13

9786207639441

Annealing Temperatures Effect on Nickel Oxide Thin Films (en Inglés)

Said Benramache; Okba Belahssen (Autor) · Lap Lambert Academic Publishing · Tapa Blanda

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Reseña del libro "Annealing Temperatures Effect on Nickel Oxide Thin Films (en Inglés)"

In the present paper, NiO thin films were prepared on glass substrates using a spin coating method with 0.7 M. There the NiO thin films were heated at different crystallization temperatures of 25, 450, 500, 550 and 600 C for 2 hours. XRD spectra of prepared NiO thin films indicate that the films have a polycrystalline structure; it is the cubic type of NiO. We have obtained that the crystallite size was increased to the maximum value of 50.32 nm of (200) plane was obtained at 600 C. We conclude that the crystallinity of NiO thin films was improved with increasing crystallization temperature, it depends too few defects. Spectrophotometer (UV-vis) of NiO films shows an average optical transmission of about 85%. The optical bandgap energy was increased after crystallized from 3.101 for without crystallization to 3.855 eV for a crystallized film at 500 C. At high crystallization temperature, we found that the NiO thin films have the lowest disorder, the minimum Urbach energy was obtained at a temperature of 600 C is 180 meV. The NiO thin films have a good electrical property with the minimum of the sheet resistance was found at a lower temperature.